Equipment
Rapid Thermal Processor
Model:
SSI Solaris 100 Rapid Thermal Processor
Capabilities:
This tool is capable of flash heating substrates.
Cost:
Calendar for Reservations:
(From Wikipedia)
Rapid Thermal Processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1,200 °C or greater) on a timescale of several seconds or less. During cooling, however, wafer temperatures must be brought down slowly so they do not break due to thermal shock. Such rapid heating rates are often attained by high intensity lamps or lasers. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.
Process capabilities:
The Solaris 100 is a manual loading RTP system for R&D and pre-production. The Solaris 100 can process up to 6? substrates at a temperature range from RT- 1300 degrees Celsius(2372 deg F). The Solaris 100 utilizes 13 quartz halogen lamps on top and bottom of the wafer to reduce non-uniform heating from pattern effects seen on single sided RTA systems. The high-purity quartz wafer holder and chamber is manufactured out of semiconductor grade low OH quartz to eliminate metallic contamination. The oven contains gold reflectors for fast heating rates and long lamp lifetimes.